Wafer exposure equipment (mask aligner)
Fully automatic type (2 to 12 inch and square type, etc.) wafer exposure equipment
Overview Adopts a unique UV optical system optimized for high-precision exposure and a mechanism that can align photomasks and wafers with high accuracy. Fully automatic exposure equipment compatible with vacuum contact, soft contact, and proximity, with custom options available.
- Company:清和光学製作所
- Price:Other